Are you working on advanced chip technologies and looking for new ways to create structures at nanoscale? This webinar provides insight into the potential of Ion Beam Lithography (IBL) and how this technology can be applied in research and development.
Understanding Ion Beam Lithography
Ion Beam Lithography is a technique that enables highly precise patterning of materials. It allows you to create structures that are difficult to achieve with conventional lithography methods.
During the webinar, the following topics will be covered:
the fundamentals of Ion Beam Lithography
applications in micro- and nanofabrication
opportunities for research and prototyping
how this technology compares to other lithography techniques
Who is it for?
This webinar is relevant for professionals and organisations working in:
semiconductors and nanotechnology
chip design and fabrication processes
photonics and advanced materials
research and development in high-tech
Practical information
The webinar will take place on 8 April 2026 at 15:00 (CET) and will be held online via Zoom.
Would you like to join the webinar and learn more about Ion Beam Lithography? Register via the registration page to receive further details about the programme and access to the session.
Register
